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微波等离子体化学气相沉积(MPCVD)是制备高品质金刚石的首选。优化MPCVD设备设计,提高其可输入功率水平,是改善MPCVD法沉积刚石效率的有效途径。随着计算机技术的进步,数值模拟极大地促进了MPCVD设备研制技术的发展。近年来,培育钻石市场的繁荣和金刚石材料在高新技术领域迫切的应用需求,使MPCVD技术在其被发明30多年后又迎来新的研究热潮。本文首先简要综述了高功率MPCVD设备研制及微波等离子体数值模拟技术的发展历史及其现状;其次,简单介绍了河北普莱斯曼金刚石科技有限公司近年来在MPCVD技术领域的研究进展;最后对金刚石产品在相关领域的应用进行简单介绍与展望。
Abstract:Microwave plasma chemical vapor deposition(MPCVD) is the preferred method for preparing high-quality diamonds. Optimizing the design of MPCVD equipment and increasing its input power level are effective strategies to improve the efficiency of diamond deposition by MPCVD. Advances in computer technology have significantly promoted the development of MPCVD through numerical simulation of microwave plasma. The prosperity of the laboratory-grown diamond market and the urgent demand for the application of diamond materials in high-tech fields have led to a new research boom in MPCVD since its invention over 30 years ago. This article first outlines the development of high-power MPCVD equipment and microwave plasma numerical simulation technology. Furthermore, the recent research progress of Hebei Plasma Diamond Technology Co., Ltd. in this field is highlighted. Finally, the applications of diamond products in related fields are briefly discussed along with future prospects.
[1] SEDOV V,WEI J,RALCHENKO V.Polycrystalline diamond:recent advances in CVD synthesis and applications[J].Novel Aspects of Diamond II,2024,149:101-144.
[2] SHIMAOKA T,KOIZUMI S,KANEKO JH,et al.Recent progress in diamond radiation detectors[J].Functional Diamond,2022,1(1):205-220.
[3] ENGELS J,WEIPPERT J,LUO T,et al.High ODMR contrast and alignment of NV centers in microstructures grown on heteroepitaxial diamonds[J].Applied Physics Letters,2024,124(16):1-6.
[4] WELLMANN P,OHTANI N,RUPP R.Wide bandgap semiconductors for power electronics[M].Hoboken,NJ:Wiley Press Room,2022.
[5] ZULKHARNAY R,MAY P W.Applications of diamond films:a review[J].Functional Diamond,2024,4(1):2410160.DOI:10.1080/2694/112.2024.2410160.
[6] 李义锋,姜龙,安晓明,等.化学气相沉积大尺寸多晶金刚石膜及其应用研究进展[J].真空电子技术,2022(5):1-12,19.
[7] SILVA F,HASSOUNI K,BONNIN X,et al.Microwave engineering of plasma-assisted CVD reactors for diamond deposition[J].Journal of Physics:Condensed Matter,2009,21(36):364202.DOI:10.1088/09538984/211361364202.
[8] BATAINEH M,KHATAMI S,ASMUSSEN J.A comparative study of the effects of reactor geometry on the quality of CVD diamond films deposited on silicon substrates with mixture of CH4/H2 gas flow[J].Journal of Materials Processing Technology,2005,169(1):26-37.
[9] MALLIK A K,BYSAKH S,PAL K S,et al.Large area deposition of polycrystalline diamond coatings by microwave plasma CVD[J].Transactions of the Indian Ceramic Society,2013,72(4):225-232.
[10] LI Yifeng,AN Xiaoming,LIU Xiaochen,et al.A 915MHz/75kW cylindrical cavity type microwave plasma chemical vapor deposition reactor with a ladder-shaped circumferential antenna developed for growing large area diamond films[J].Diamond and Related Materials,2017,78:67-72.
[11] LI Yifeng,SU Jingjie,LIU Yanqing,et al.Design of a new TM021 mode cavity type MPCVD reactor for diamond film deposition[J].Diamond and Related Materials,2014,44:88-94.
[12] LI Yifeng,SU Jingjie,LIU Yanqing,et al.A circumferential antenna ellipsoidal cavity type MPCVD reactor developed for diamond film deposition[J].Diamond and Related Materials,2015,51:24-29.
[13] HEMAWAN K,GROTJOHN T,REINHARD D,et al.Improved microwave plasma cavity reactor for diamond synthesis at high-pressure and high power density[J].Diamond and Related Materials,2010,19(12):1446-1452.
[14] FüNER M,WILD C,KOIDL P.Novel microwave plasma reactor for diamond synthesis[J].Applied Physics Letters,1998,72(10):1149-1151.
[15] FüNER M,WILD C,KOIDL P.Simulation and development of optimized microwave plasma reactors for diamond deposition[J].Surface and Coatings Technology,1999,116:853-862.
[16] GICQUEL A,HASSOUNI K,SILVA F,et al.CVD diamond films:from growth to applications[J].Current Applied Physics,2001,1(6):479-496.
[17] TACHIBANA T,ANDO Y,WATANABE A,et al.Diamond films grown by a 60-kW microwave plasma chemical vapor deposition system[J].Diamond and Related Materials,2001,10(9/10):1569-1572.
[18] 李义锋,唐伟忠,姜龙,等.915MHz高功率MPCVD装置制备大面积高品质金刚石膜[J].人工晶体学报,2019,48(7):1262-1267.
[19] 安晓明,葛新岗,刘晓晨,等.高功率CO2激光器CVD金刚石窗口制备研究[J].人工晶体学报,2021,50(6):1010-1015.
[20] 李义锋,姜龙,安晓明,等.大尺寸低损耗金刚石窗片制备及微波窗口封接[J].真空电子技术,2024(5):78-82.
[21] 李义锋,姜龙,安晓明,等.用于兆瓦级回旋管的金刚石窗片的研制[J/OL].核聚变与等离子体物理.(2024-03-19) [2024-12-11].http://kns.cnki.net/kcms/detail/51.1151.tl.20240313.1539.004.html.
[22] 刘晓晨,葛新岗,李义锋,等.用于小角散射原位加载测试的单晶金刚石窗口制备工艺研究[J].人工晶体学报,2019,48(11):1992-1998.
[23] 刘晓晨,李贞杰,王炳杰,等.CVD单晶金刚石X射线位置探测器研制[J].核电子学与探测技术,2022,42(2):355-359.
[24] 刘晓晨,郁鑫鑫,葛新岗,等.氮掺杂对氢终端金刚石射频器件特性的影响[J].人工晶体学报,2021,50(11):2045-2052.
[25] 杨志亮,鲁新如,徐健,等.硼掺杂金刚石厚膜电极对高浓度工业废水的降解实验研究[J].表面技术,2021,50(3):212-218.
[26] 张雅淋,王朝阳,葛新岗,等.掺硼金刚石膜电极电解染料废水的研究[J].河北省科学院学报,2023,40(4):55-62.
[27] SEVILLANO E,WILLIAMS B.Reactor development for microwave plasma deposition of diamond[J].Diamond Films and Technology,1998,8(2):73-91.
[28] 李义锋.新型高功率MPCVD装置研制与金刚石膜高效沉积[D].北京:北京科技大学,2015.
[29] PLEULER E,WILD C,FüNER M,et al.The CAP-reactor,a novel microwave CVD system for diamond deposition[J].Diamond and Related Materials,2002,11(3/6):467-471.
[30] LI Xiaojing,TANG Weizhong,YU Shengwang,et al.Design of novel plasma reactor for diamond film deposition[J].Diamond and Related Materials,2011,20(4):480-484.
[31] WENG Jun,XIONG Liwei,WANG Jianhua,et al.Investigation of depositing large area uniform diamond films in multi-mode MPCVD chamber[J].Diamond and Related Materials,2012,30:15-19.
[32] ANDO Y,YOKOTA Y,TACHIBANA T,et al.Large area deposition of<100>-textured diamond films by a 60-kW microwave plasma CVD reactor[J].Diamond and Related Materials,2002,11(3/6):596-600.
[33] YOKOTA Y,ANDO Y,KOBASHI K,et al.Morphology control of diamond films in the region of α=1-1.5 using a 60-kW microwave plasma CVD reactor[J].Diamond and Related Materials,2003,12(3/7):295-297.
[34] GROTJOHN T,LISKE R,HASSOUNI K,et al.Scaling behavior of microwave reactors and discharge size for diamond deposition[J].Diamond and Related Materials,2005,14(3/7):288-291.
[35] Elementsix.Learn more about element six[EB/OL].[2024-11-27].https://www.e6.com/en.
[36] Optosystems.ARDIS 300[EB/OL].[2024-11-27].https://optosystems.ru/en/product/ardis-300.
[37] 胡海天,邬钦崇,盛奕建.微波等离子体化学气相沉积金刚石膜[J].物理,1996,25(11):688-696.
[38] 吕庆敖,邬钦崇.微波等离子体化学气相沉积装置的工作原理[J].真空与低温,1997(2):14-16.
[39] 周程.高功率MPCVD法制备光学级金刚石膜的研究[D].武汉:武汉工程大学,2018.
[40] WENG Jun,LIU Fan,WANG Z T,et al.Investigation on the preparation of large area diamond films with 150-200 mm in diameter using 915MHz MPCVD system[J].Vacuum,2023,217:112543.DOI:10.1016/j.vacuum.2023.112543.
[41] YAN Xinsheng,ZHAO Lianmin,XU Weiye,et al.Design of an edge tapered 915 MHz/TM021 microwave plasma reactor by numerical analysis[J].AIP Advances,2021,11(3):1-8.
[42] SU J,LI Y,LIU Y,et al.Development of cylinderical cavity type microwave plasma CVD reactor for diamond films deposition[C]//2013 19th IEEE Pulsed Power Conference (PPC).San Francisco,CA,USA:IEEE,2013:1-6.
[43] SU Jingjie,LI Yifeng,DING Minghui,et al.A dome-shaped cavity type microwave plasma chemical vapor deposition reactor for diamond films deposition[J].Vacuum,2014,107:51-55.
[44] AN Kang,YU Shengwang,LI Xiaojing,et al.Microwave plasma reactor with conical-reflector for diamond deposition[J].Vacuum,2015,117:112-120.
[45] WANG Qijun,WU Gai,LIU Sheng,et al.Simulation-based development of a new cylindrical-cavity microwave-plasma reactor for diamond-film synthesis[J].Crystals,2019,9(6):320.
[46] 彭勃.新型弧面调节大功率MPCVD装置的优化与设计[D].淄博:山东理工大学,2020.
[47] ZHANG Yizhuo,YU Shengwang,GAO Jie,et al.Design and simulation of a novel MPCVD reactor with three-cylinder cavity[J].Vacuum,2022,200:111055.DOI:10.1016/j.vacuum.2022.111055.
[48] 产思义,屠菊萍,黄珂,等.2英寸MPCVD光学级均匀金刚石膜的制备研究[J].无机材料学报,2023,38(12):1413-1419.
[49] CHAN Siyi,TU Juping,HUANG Ke,et al.Oriented growth of 5-inch optical polycrystalline diamond films by suppressing dark features[J].Ceramics International,2024,50(19):37111-37118.
[50] 李义锋,唐伟忠,苏静杰,等.环形天线-椭球谐振腔式MPCVD装置高功率下沉积高品质金刚石膜[J].人工晶体学报,2016,45(8):2028-2033.
[51] 吴高华,王兵,熊鹰,等.氧碳比对MPCVD法同质外延单晶金刚石的影响[J].功能材料,2013,44(14):2065-2068,2073.
[52] SILVA F,BONNIN X,SCHARPF J,et al.Microwave analysis of PACVD diamond deposition reactor based on electromagnetic modelling[J].Diamond and Related Materials,2010,19(5/6):397-403.
[53] GROTJOHN T,TAN W,GOPINATH V,et al.Modeling the electromagnetic excitation of a compact ECR ion/free radical sourcea[J].Review of Scientific Instruments,1994,65(5):1761-1765.
[54] TAN W,GROTJOHN T.Modeling the electromagnetic excitation of a microwave cavity plasma reactor[J].Journal of Vacuum Science & Technology A,1994,12(4):1216-1220.
[55] TAN W,GROTJOHN T A.Modelling the electromagnetic field and plasma discharge in a microwave plasma diamond deposition reactor[J].Diamond and Related Materials,1995,4(9):1145-1154.
[56] HASSOUNI K,GROTJOHN T,GICQUEL A.Self-consistent microwave field and plasma discharge simulations for a moderate pressure hydrogen discharge reactor[J].Journal of Applied Physics,1999,86(1):134-151.
[57] HASSOUNI K,GICQUEL A,CAPITELLI M,et al.Chemical kinetics and energy transfer in moderate pressure H2 plasmas used in diamond MPACVD processes[J].Plasma Sources Science and Technology,1999,8(3):494-512.
[58] FüNER M,WILD C,KOIDL P.Numerical simulations of microwave plasma reactors for diamond CVD[J].Surface and Coatings Technology,1995,74-75(1):221-226.
[59] YAMADA H,CHAYAHARA A,MOKUNO Y,et al.Modeling and numerical analyses of microwave plasmas for optimizations of a reactor design and its operating conditions[J].Diamond and Related Materials,2005,14(11/12):1776-1779.
[60] YAMADA H,CHAYAHARA A,MOKUNO Y,et al.Numerical analysis of power absorption and gas pressure dependence of microwave plasma using a tractable plasma description[J].Diamond and Related Materials,2006,15(9):1395-1399.
[61] 柴中林,唐伟忠,李安贵,等.应用于微波电磁场FDTD数值模拟的吸收边界条件[J].北京工商大学学报(自然科学版),2003,21(3):61-64.
[62] 王仁海,邹卫东.大面积微波CVD反应腔中电磁场分布的研究[J].黄冈师范学院学报,2002,22(6):23-25,78.
[63] 邹卫东,杨磊,孙亦宁,等.金刚石膜气相沉淀技术中微波等离子体反应腔的数值模拟[J].真空与低温,2000(2):24-28.
[64] 王凤英,郭会斌,唐伟忠,等.圆柱形和椭球形谐振腔式MPCVD装置中微波等离子体分布特征的数值模拟与比较[J].人工晶体学报,2008,37(4):895-900,907.
[65] CUI Hongbo,LIU Bentian,ZHANG Wenbing,et al.Simulation analysis of a novel TM021 mode microwave resonant cavity[C]//2023 Cross Strait Radio Science and Wireless Technology Conference (CSRSWTC).Guilin,China:IEEE,2023:1-2.
[66] 河北普莱斯曼金刚石科技有限公司官网首页[EB/OL].[2024-22-21].https://www.hediamond.cn/en/.
[67] W?RNER E,WILD C.Polycrystalline CVD diamond for industrial applications[J].Comprehensive Hard Materials,2014,3:365-377.
[68] 林楠,杨文河,陈韫懿,等.极紫外光刻光源的研究进展及发展趋势[J].激光与光电子学进展,2022,59(9):15-34.
[69] 宗楠,胡蔚敏,王志敏,等.激光等离子体13.5nm极紫外光刻光源进展[J].中国光学,2020,13(1):28-42.
[70] 杜英华,胡银富,丁明清,等.金刚石在太赫兹电真空器件中的应用[J].太赫兹科学与电子信息学报,2013(3):350-354.
基本信息:
DOI:10.16191/j.cnki.hbkx.2025.06.009
中图分类号:TQ163
引用信息:
[1]李义锋,姜龙,安晓明,等.高功率微波等离子体化学气相沉积金刚石设备研发与应用[J].河北省科学院学报,2025,42(06):27-40.DOI:10.16191/j.cnki.hbkx.2025.06.009.
基金信息:
国家磁约束核聚变能发展研究专项资助(2019YFE03100300); 河北省自然科学基金(E2019302005); 河北省科学院科技计划项目(18502;19502;20502;2021G05;2022G12;2023G22)
